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Layout and Mask Conventions
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Exposures from Mask Aligner into Resist • Mask aligner images created by shadowing from mask into resist • Soft contact and
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Exposures from Mask Aligner into Resist • Mask aligner images created by shadowing from mask into resist • Soft contact and
![ASML - [반도체 이야기] 노광장비 기술의 발전 노광 공정은 감광액이 코팅된 웨이퍼에 노광장비를 이용하여 마스크(MASK)에 그려진 회로패턴에 빛을 통과시켜 감광액(PR)이 도포된 웨이퍼에 회로 패턴을 사진찍는 작업입니다. 카메라를 이용하여 필름을 현상하는 원리와 ...](https://lookaside.fbsbx.com/lookaside/crawler/media/?media_id=1453971981318919 "ASML - [반도체 이야기] 노광장비 기술의 발전 노광 공정은 감광액이 코팅된 웨이퍼에 노광장비를 이용하여 마스크(MASK)에 그려진 회로패턴에 빛을 통과시켜 감광액(PR)이 도포된 웨이퍼에 회로 패턴을 사진찍는 작업입니다. 카메라를 이용하여 필름을 현상하는 원리와 ...")