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Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
The investigation of DARC etch back in DRAM capacitor oxide mask opening
28nm Metal Hard Mask etch process development | Semantic Scholar
Etch mechanism of an Al2O3 hard mask in the Bosch process - ScienceDirect
Figure 5 from Aluminum oxide hard mask fabrication by focused ion beam implantation and wet etching | Semantic Scholar
Spin-on Dual Hard Mask Material | JSR Micro NV
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Microwaves101 | Photolithography 101
Use of oxide hard mask for patterning low-κ dielectric. | Download Scientific Diagram
Sublithographic patterning technology: photoresist ashing-hard mask... | Download Scientific Diagram
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
Fullerene-based spin-on-carbon hardmask - ScienceDirect
Photomask
Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
Photolithography Overview
Etch Overview
Shrinking Feature Size: Light Sources to OPC - An Introduction to Semiconductor Physics, Technology, and Industry
Lego like silicon electronics fabricated with hybrid etching masks
Fabrication flow of the device. (a) Hard mask definition. (b) ICP-DRIE.... | Download Scientific Diagram
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硬掩模Hard Mask (HM)
